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Undoped InAs Substrate , 2”, Test Grade -Indium Arsenide Wafer Supplier

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XIAMEN POWERWAY ADVANCED MATERIAL CO., LTD.
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Province/State:fujian
Country/Region:china
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Undoped InAs Substrate , 2”, Test Grade -Indium Arsenide Wafer Supplier

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Brand Name :PAM-XIAMEN
Place of Origin :China
MOQ :1-10,000pcs
Payment Terms :T/T
Supply Ability :10,000 wafers/month
Delivery Time :5-50 working days
Packaging Details :Packaged in a class 100 clean room environment, in single container, under a nitrogen atmosphere
product name :single crystal InAs Wafer
Wafer Diamter :2 inch
Conduction Type :N Type
Grade :Test Grade
Wafer Thickness :500±25um
keyword :Indium arsenide wafer
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Undoped InAs Substrate , 2”, Test Grade -Indium Arsenide Wafer Supplier
PAM-XIAMEN provides single crystal InAs(Indium arsenide) wafer for infrared detectors, photovoltaic photodiodes detectors, diode lasers in lower noise or higher-power applications at room temperature. in diameter up to 4 inch. Indium Arsenide ( InAs ) crystal is formed by two elements , Indium and Arsenide , growth by Liquid Encapsulated Czochralski ( LEC ) method or VGF method . InAs wafer is is similar to gallium arsenide and is a direct bandgap material.
Indium arsenide is sometimes used together with indium phosphide. Alloyed with gallium arsenide it forms indium gallium arsenide - a material with band gap dependent on In/Ga ratio, a method principally similar to alloying indium nitride with gallium nitride to yield indium gallium nitride. PAM-XIAMEN can provide epi ready grade InAs wafer for your MOCVD & MBE epitaxial application .Please contact our engineer team for more wafer information.

2" InAs Wafer Specification

ItemSpecifications
DopantUndoped
Conduction TypeN-type
Wafer Diameter2"
Wafer Orientation(100)±0.5°
Wafer Thickness500±25um
Primary Flat Length16±2mm
Secondary Flat Length8±1mm
Carrier Concentration5x1016cm-3
Mobility≥2x104cm2/V.s
EPD<5x104cm-2
TTV<10um
BOW<10um
WARP<12um
Laser markingupon request
Suface finishP/E, P/P
Epi readyyes
PackageSingle wafer container or cassette


What is the InAs Process?
InAs wafers must be prepared prior to device fabrication. To start, they must be completely cleaned to remove any damage that might have occurred during the slicing process. The wafers are then Chemically Mechanically Polished/Plaranrized (CMP) for the final material removal stage. This allows for the attainment of super-flat mirror-like surfaces with a remaining roughness on an atomic scale. After that is completed, the wafer is ready for fabrication.

Band structure and carrier concentration of InAs Wafer

Basic Parameters

Energy gap0.354 eV
Energy separation (EΓL) between Γ and L valleys0.73 eV
Energy separation (EΓX) between Γ and X valleys1.02 eV
Energy spin-orbital splitting0.41 eV
Intrinsic carrier concentration1·1015 cm-3
Intrinsic resistivity0.16 Ω·cm
Effective conduction band density of states8.7·1016 cm-3
Effective valence band density of states6.6·1018 cm-3

Undoped InAs Substrate , 2”, Test Grade -Indium Arsenide Wafer SupplierBand structure and carrier concentration of InAs.
Important minima of the conduction band and maxima of the valence band.
Eg= 0.35 eV
EL= 1.08 eV
EX= 1.37 eV
Eso = 0.41 eV

Temperature Dependences

Temperature dependence of the direct energy gap

Eg = 0.415 - 2.76·10-4·T2/(T+83) (eV),

where T is temperature in degrees K (0 <T < 300).

Effective density of states in the conduction band

Nc≈1.68·1013·T3/2 (cm-3).

Effective density of states in the valence band

Nv≈ 1.27·1015·T3/2(cm-3).

Undoped InAs Substrate , 2”, Test Grade -Indium Arsenide Wafer SupplierThe temperature dependences of the intrinsic carrier concentration.
Undoped InAs Substrate , 2”, Test Grade -Indium Arsenide Wafer SupplierFermi level versus temperature for different concentrations of shallow donors and acceptors.

Dependences on Hydrostatic Pressure

Eg≈Eg(0) + 4.8·10-3P (eV)
EL≈ EL(0) + 3.2·10-3P (eV)

where P is pressure in kbar

Energy Gap Narrowing at High Doping Levels

Undoped InAs Substrate , 2”, Test Grade -Indium Arsenide Wafer SupplierEnergy gap narrowing versus donor (Curve 1) and acceptor (Curve 2 ) doping density.
Curves are calculated according
Points show experimental results for n-InAs

For n-type InAs

ΔEg = 14.0·10-9·Nd1/3 + 1.97·10-7·Nd1/4 + 57.9·10-12·Nd1/2 (eV)

For p-type InAs

ΔEg = 8.34·10-9·Na1/3 + 2.91·10-7·Na1/4 + 4.53·10-12·Na1/2 (eV)

Effective Masses

Electrons:

Undoped InAs Substrate , 2”, Test Grade -Indium Arsenide Wafer SupplierElectron effective mass versus electron concentration

For Γ-valleymΓ = 0.023mo
Nonparabolicity:
E(1+αE) = h2k2/(2mΓ)
α = 1.4 (eV-1)
In the L-valley effective mass of density of statesmL=0.29mo
In the X-valley effective mass of density of statesmX=0.64mo

Holes:

Heavymh = 0.41mo
Lightmlp = 0.026mo
Split-off bandmso = 0.16mo

Effective mass of density of states mv = 0.41mo

Donors and Acceptors

Ionization energies of shallow donors

≥ 0.001(eV): Se, S, Te, Ge, Si, Sn, Cu

Ionization energies of shallow acceptors, eV

SnGeSiCdZn
0.010.0140.020.0150.01


Are You Looking for an InAs Wafer?
PAM-XIAMEN is your go-to place for everything wafers, including InAs wafers, as we have been doing it for almost 30 years! Enquire us today to learn more about the wafers that we offer and how we can help you with your next project. Our group team is looking forward to providing both quality products and excellent service for you!




















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